Abe, Tsukasa: шукати на сайті Z-Library

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Найбільша колекція наукових статей у сіті. 70,000,000+ безкоштовних статей.

Пожертвування 15 вересня 2024 – 1 жовтня 2024

Z-Library - одна з найбільших онлайн-бібліотек у світі, в якій зберігається більше 17,000,000 книг та 84,837,000 статей. Ми намагаємось зробити літературу доступною кожному. Сьогодні (15 вересня 2024) ми відкриваємо додатковий збір пожертвувань на підтримку та розвиток проекту.

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Статті (298)
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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Performance of 250W high-power HVM LPP-EUV source

Panning, Eric M., Goldberg, Kenneth A., Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Sh

Рік:

2017

Мова:

english

Файл:

PDF, 2.03 MB

english, 2017

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography

Fujimoto, Junichi, Hori, Tsukasa, Yanagida, Tatsuya, Ohta, Takeshi, Kawasuji, Yasufumi, Shiraishi, Yutaka, Abe, Tamotsu, Kodama, Takeshi, Nakarai, Hiroaki, Yamazaki, Taku, Mizoguchi, Hakaru, Naulleau,

Рік:

2012

Мова:

english

Файл:

PDF, 1.75 MB

english, 2012

3

Enhancement of Drain Current by an AlN Spacer Layer Insertion in AlGaN/GaN High-Electron-Mobility Transistors with Si-Ion-Implanted Source/Drain Contacts

Nanjo, Takuma, Motoya, Tsukasa, Imai, Akihumi, Suzuki, Yosuke, Shiozawa, Katsuomi, Suita, Muneyoshi, Oishi, Toshiyuki, Abe, Yuji, Yagyu, Eiji, Yoshiara, Kiichi, Tokuda, Yasunori

Журнал:

Japanese Journal of Applied Physics

Рік:

2011

Мова:

english

Файл:

PDF, 1.09 MB

english, 2011

4

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - EUV-mask pattern inspection using current DUV reticle inspection tool

Abe, Tsukasa, Fujii, Akiko, Sasaki, Shiho, Mohri, Hiroshi, Imai, Hidemichi, Takaya, Hironobu, Sato, Yasushi, Hayashi, Naoya, Maenaka, Yumiko, Watanabe, Hidehiro

Рік:

2007

Мова:

english

Файл:

PDF, 1.13 MB

english, 2007

5

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Characterization of line-width roughness about 22-32nm node EUV mask

Inazuki, Yuichi, Hosono, Kunihiro, Abe, Tsukasa, Takikawa, Tadahiko, Mohri, Hiroshi, Hayashi, Naoya

Рік:

2010

Мова:

english

Файл:

PDF, 1.51 MB

english, 2010

6

Factors affecting selective electrocatalytic co2 reduction with cobalt phthalocyanine incorporated in a polyvinylpyridine membrane coated on a graphite electrode

Toshiyuki Abe, Tsukasa Yoshida, Sumio Tokita, Fumio Taguchi, Hiroshi Imaya, Masao Kaneko

Журнал:

Journal of Electroanalytical Chemistry

Рік:

1996

Мова:

english

Файл:

PDF, 800 KB

english, 1996

7

Measurement of the phase defect size using a scanning probe microscope and at-wavelength inspection tool

Amano, Tsuyoshi, Abe, Tsukasa

Журнал:

Journal of Micro/Nanolithography MEMS and MOEMS

Рік:

2015

Мова:

english

Файл:

PDF, 1.76 MB

english, 2015

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Performance of new high-power HVM LPP-EUV source

Panning, Eric M., Goldberg, Kenneth A., Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Sh

Рік:

2016

Мова:

english

Файл:

PDF, 1.64 MB

english, 2016

9

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Investigation of the influence of resist patterning on absorber LWR for 22-nm-node EUV lithography

Inazuki, Yuichi, Montgomery, M. Warren, Maurer, Wilhelm, Shimomura, Takeya, Abe, Tsukasa, Ogase, Taichi, Kawashima, Satoshi, Takigawa, Tadahiko, Mohri, Hiroshi, Hayashi, Naoya

Рік:

2010

Мова:

english

Файл:

PDF, 927 KB

english, 2010

10

Lansoprazole for secondary prevention of gastric or duodenal ulcers associated with long-term low-dose aspirin therapy: results of a prospective, multicenter, double-blind, randomized, double-dummy, active-controlled trial

Kentaro Sugano, Yasushi Matsumoto, Tsukasa Itabashi, Sumihisa Abe, Nobuhiro Sakaki, Kiyoshi Ashida, Yuji Mizokami, Tsutomu Chiba, Shigeyuki Matsui, Tatsuya Kanto, Kazuyuki Shimada, Shinichiro Uchiyama

Журнал:

Journal of Gastroenterology

Рік:

2011

Мова:

english

Файл:

PDF, 247 KB

english, 2011

11

Novel mechanism of self-injecting magnetic fluid seal applying switch of magnetic force direction on yoke surface

Yasunaga Mitsuya, Tsukasa Abe, Shigeki Matsunaga

Журнал:

Journal of Magnetism and Magnetic Materials

Рік:

1993

Мова:

english

Файл:

PDF, 318 KB

english, 1993

12

Effects of zinc supplementation on serum zinc concentration and ratio of apo/holo-activities of angiotensin converting enzyme in patients with taste impairment

Tsukasa Takaoka, Nobuko Sarukura, Chizuru Ueda, Yoshiaki Kitamura, Bukasa Kalubi, Naoki Toda, Koji Abe, Shigeru Yamamoto, Noriaki Takeda

Журнал:

Auris Nasus Larynx

Рік:

2010

Мова:

english

Файл:

PDF, 374 KB

english, 2010

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - LPP-EUV light source development for high volume manufacturing lithography

Mizoguchi, Hakaru, Naulleau, Patrick P., Nakarai, Hiroaki, Abe, Tamotsu, Ohta, Takeshi, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Shira

Рік:

2013

Мова:

english

Файл:

PDF, 427 KB

english, 2013

14

Development of DNA markers for identifying chrysanthemum cultivars generated by ion-beam irradiation

Tsukasa Shirao, Kei-ichiro Ueno, Tomoko Abe, Tomoki Matsuyama

Журнал:

Molecular Breeding

Рік:

2013

Мова:

english

Файл:

PDF, 548 KB

english, 2013

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Performance of one hundred watt HVM LPP-EUV source

Wood, Obert R., Panning, Eric M., Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Shiraish

Рік:

2015

Мова:

english

Файл:

PDF, 1.14 MB

english, 2015

16

Phase defect detection signal analysis: dependence of defect size variation

Amano, Tsuyoshi, Watanabe, Hidehiro, Abe, Tsukasa

Журнал:

Journal of Micro/Nanolithography MEMS and MOEMS

Рік:

2015

Мова:

english

Файл:

PDF, 2.54 MB

english, 2015

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - First generation laser-produced plasma source system for HVM EUV lithography

Mizoguchi, Hakaru, Abe, Tamotsu, Watanabe, Yukio, Ishihara, Takanobu, Ohta, Takeshi, Hori, Tsukasa, Kurosu, Akihiko, Komori, Hiroshi, Kakizaki, Kouji, Sumitani, Akira, Wakabayashi, Osamu, Nakarai, Hir

Рік:

2010

Мова:

english

Файл:

PDF, 1.44 MB

english, 2010

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Measurement of the phase defect size using scanning probe microscope and at-wavelength inspection tool

Wood, Obert R., Panning, Eric M., Amano, Tsuyoshi, Abe, Tsukasa

Рік:

2015

Мова:

english

Файл:

PDF, 434 KB

english, 2015

19

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Electron beam inspection of 16nm HP node EUV masks

Shimomura, Takeya, Abboud, Frank E., Faure, Thomas B., Narukawa, Shogo, Abe, Tsukasa, Takikawa, Tadahiko, Hayashi, Naoya, Wang, Fei, Ma, Long, Lin, Chia-Wen, Zhao, Yan, Kuan, Chiyan, Jau, Jack

Рік:

2012

Мова:

english

Файл:

PDF, 397 KB

english, 2012

20

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Short-range electron backscattering from EUV masks

Tanabe, Hiroyoshi, Hosono, Kunihiro, Abe, Tsukasa, Inazuki, Yuichi, Hayashi, Naoya

Рік:

2010

Мова:

english

Файл:

PDF, 2.10 MB

english, 2010

21

SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - NGL masks: development status and issue

Hayashi, Naoya, Behringer, Uwe F.W., Abe, Tsukasa, Shimomura, Takeya, Inazuki, Yuichi, Takikawa, Tadahiko, Mohri, Hiroshi

Рік:

2011

Мова:

english

Файл:

PDF, 4.26 MB

english, 2011

22

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - PSM quartz etch depth evaluation with an atomic force microscope

Noguchi, Kenji, Tanabe, Hiroyoshi, Sasaki, Shiho, Yoshida, Yuuichi, Adachi, Takashi, Abe, Tsukasa, Mohri, Hiroshi, Kokubo, Haruo, Morikawa, Yasutaka, Hayashi, Naoya

Рік:

2003

Мова:

english

Файл:

PDF, 400 KB

english, 2003

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - 100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Mizoguchi, Hakaru, La Fontaine, Bruno M., Naulleau, Patrick P., Abe, Tamotsu, Watanabe, Yukio, Ishihara, Takanobu, Ohta, Takeshi, Hori, Tsukasa, Yanagida, Tatsuya, Nagano, Hitoshi, Yabu, Takayuki, Nag

Рік:

2011

Мова:

english

Файл:

PDF, 924 KB

english, 2011

24

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - EUV mask development status at ASET and DNP

Abe, Tsukasa, Hoga, Morihisa, Fujii, Akiko, Mohri, Hiroshi, Hayashi, Naoya, Tanaka, Yuusuke, Nishiyama, Iwao

Рік:

2006

Мова:

english

Файл:

PDF, 678 KB

english, 2006

25

SPIE Proceedings [SPIE 28th European Mask and Lithography Conference (EMLC 2012) - Dresden, Germany (Tuesday 17 January 2012)] 28th European Mask and Lithography Conference - Mask readiness for EUVL pilot line

Hayashi, Naoya, Abe, Tsukasa, Takikawa, Tadahiko, Behringer, Uwe F.W., Maurer, Wilhelm

Рік:

2012

Мова:

english

Файл:

PDF, 1.57 MB

english, 2012

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?

Panning, Eric M., Goldberg, Kenneth A., Amano, Tsuyoshi, Iida, Susumu, Hirano, Ryoichi, Abe, Tsukasa, Morikawa, Yasutaka, Watanabe, Hidehiro

Рік:

2016

Мова:

english

Файл:

PDF, 1.28 MB

english, 2016

27

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Evaluation of pattern fidelity in EUVL using a high-numerical-aperture small-field EUV exposure tool (HiNA)

Tanaka, Yuusuke, Mackay, R. Scott, Oizumi, Hiroaki, Hashimoto, Takeo, Kumasaka, Fumiaki, Nishiyama, Iwao, Abe, Tsukasa, Mohri, Hiroshi, Hayashi, Naoya

Рік:

2005

Мова:

english

Файл:

PDF, 824 KB

english, 2005

28

Effect of Mental Processing on Low Back Load While Lifting an Object

Katsuhira, Junji, Matsudaira, Ko, Iwakiri, Kazuyuki, Kimura, Yoshiki, Ohashi, Tsukasa, Ono, Ryosuke, Sugita, Sho, Fukuda, Keisuke, Abe, Soyoka, Maruyama, Hitoshi

Журнал:

Рік:

2013

Мова:

english

Файл:

PDF, 679 KB

english, 2013

29

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Natural EUV mask blank defects: evidence, timely detection, analysis and outlook

Van den Heuvel, Dieter, Montgomery, M. Warren, Maurer, Wilhelm, Jonckheere, Rik, Magana, John, Abe, Tsukasa, Bret, Tristan, Hendrickx, Eric, Cheng, Shaunee, Ronse, Kurt

Рік:

2010

Мова:

english

Файл:

PDF, 2.66 MB

english, 2010

30

Performance of 100-W HVM LPP-EUV source

Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Shiraishi, Yutaka, Yanagida, Tatsuya, Soum

Журнал:

Advanced Optical Technologies

Рік:

2015

Мова:

english

Файл:

PDF, 3.17 MB

english, 2015

31

A Study on Fundamental Burning Velocity Characteristics of Meso-Scale Propagating Spherical Laminar Flames for H2-O2-Dilution Gas Mixtures

NAKAHARA, Masaya, ONISHI, Yoshiaki, NISHIHARA, Tsukasa, ABE, Fumiaki

Журнал:

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series B

Рік:

2012

Файл:

PDF, 920 KB

2012

32

SPIE Proceedings [SPIE SPIE LASE - San Francisco, California, United States (Saturday 28 January 2017)] High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI - Development of 250W EUV light source for HVM lithography

Kaierle, Stefan, Heinemann, Stefan W., Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji,, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Sh

Рік:

2017

Мова:

english

Файл:

PDF, 3.97 MB

english, 2017

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Key components technology update of the 250W high-power LPP-EUV light source

Panning, Eric M., Goldberg, Kenneth A., Kawasuji, Yasufumi, Nowak, Krzysztof M., Hori, Tsukasa, Okamoto, Takeshi, Tanaka, Hiroshi, Watanabe, Yukio, Abe, Tamotsu, Kodama, Takeshi, Shiraishi, Yutaka, Na

Рік:

2017

Мова:

english

Файл:

PDF, 1.99 MB

english, 2017

34

High Power LPP-EUV Source with Long Collector Mirror Lifetime for Semiconductor High Volume Manufacturing

Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Shiraishi, Yutaka, Yanagida, Tatsuya, Soumagne, Georg, Yamada, Tsuyoshi, Saitou, Ta

Журнал:

Journal of Photopolymer Science and Technology

Рік:

2019

Файл:

PDF, 10.47 MB

2019

35

Recombinant human interferon α-2b (rh IFNα-2b) therapy for steroid resistant idiopathic thrombocytopenic purpura (ITP)

Fujimura, Kingo, Takafuta, Toshiro, Kuriya, Shin-ichiro, Abe, Tsukasa, Akatsuka, Jun-ichi, Yasunaga, Kojiro, Uchida, Tatsumi, Kawakita, Makoto, Kitamura, Kiyoshi, Nomura, Takeo, Kuramoto, Atsushi

Журнал:

American Journal of Hematology

Рік:

1996

Мова:

english

Файл:

PDF, 543 KB

english, 1996

36

Identification of breakpoint cluster regions at 1p36.3 and 3q21 in hematologic malignancies with t(1;3)(p36;q21)

Seiichi Shimizu, Kazumi Suzukawa, Takao Kodera, Toshiro Nagasawa, Tsukasa Abe, Masafumi Taniwaki, Fumiharu Yagasaki, Hideo Tanaka, Shin Fujisawa, Bertil Johansson, Tomas Ahlgren, Jun Yokota, Kazuhiro

Журнал:

Genes, Chromosomes and Cancer

Рік:

2000

Мова:

english

Файл:

PDF, 232 KB

english, 2000

37

Electrochemical CO2 reduction catalysed by cobalt octacyanophthalocyanine and its mechanism

Toshiyuki Abe, Hiroshi Imaya, Tsukasa Yoshida, Sumio Tokita, Derck Schlettwein, Dieter Wöhrle, Masao Kaneko

Журнал:

Journal of Porphyrins and Phthalocyanines

Рік:

1997

Мова:

english

Файл:

PDF, 237 KB

english, 1997

38

Acute monocytic leukemia cell isoferritin

Yasuhiro Yoda, Tsukasa Abe

Журнал:

Рік:

1980

Мова:

english

Файл:

PDF, 642 KB

english, 1980

39

Pure red cell aplasia in association with malignant histiocytosis

Takashi Hanada, Hideshi Yamamura, Takeshi Isobe, Masaki Nakazawa, Tsukasa Abe, Hitoshi Takita

Журнал:

Рік:

1986

Мова:

english

Файл:

PDF, 472 KB

english, 1986

40

The unbalanced 1;7 translocation in de novo myelodysplastic syndrome and its clinical implication

Shigeo Horiike, Masafumi Taniwaki, Shinichi Misawa, Hikari Nishigaki, Tsukasa Okuda, Shohei Yokota, Kei Kashima, Johji Inazawa, Tatsuo Abe

Журнал:

Рік:

1990

Мова:

english

Файл:

PDF, 450 KB

english, 1990

41

Predominant expression of lambda light chain in adult cases with non-T-cell acute lymphocytic and chronic myelogenous leukemia in lymphoid blast crisis

Naoyoshi Mori, Kuniyuki Oka, Yasuhiro Yoda, Tsukasa Abe, Mizu Kojima

Журнал:

Рік:

1991

Мова:

english

Файл:

PDF, 492 KB

english, 1991

42

Successful treatment of a patient with adult T-cell leukemia by daily oral administration of low-dose etoposide. Decrease in the amount of HTLV-I proviral DNA revealed by the polymerase chain reaction method

Hiroshi Kojima, Mitsuo Hori, Akira Shibuya, Toshiro Nagasawa, Masanao Miwa, Tsukasa Abe

Журнал:

Рік:

1993

Мова:

english

Файл:

PDF, 394 KB

english, 1993

43

Distribution of breakpoint within the breakpoint cluster region (bcr) in chronic myelogenous leukemia with a complex philadelphia chromosome translocation

Hikari Nishigaki, Johji Inazawa, Shinichi Misawa, Kazuhiro Nishida, Tsukasa Okuda, Shigeo Horiike, Shoichiro Tsuda, Masafumi Taniwaki, Tatsuo Abe

Журнал:

American Journal of Hematology

Рік:

1989

Мова:

english

Файл:

PDF, 443 KB

english, 1989

44

Polycythemia associated with primary systemic amyloidosis: Elevated levels of hemopoietic factors and cytokines

Dr. Toshiro Nagasawa, Hiromi Yanagisawa, Yuichi Hasegawa, Hiroshi Kanma, Tsukasa Abe

Журнал:

American Journal of Hematology

Рік:

1993

Мова:

english

Файл:

PDF, 745 KB

english, 1993

45

Human brain structural change related to acute single exposure to sarin

Hidenori Yamasue, Osamu Abe, Kiyoto Kasai, Motomu Suga, Akira Iwanami, Haruyasu Yamada, Mamoru Tochigi, Toshiyuki Ohtani, Mark A. Rogers, Tsukasa Sasaki, Shigeki Aoki, Tadafumi Kato, Nobumasa Kato

Журнал:

Annals of Neurology

Рік:

2007

Мова:

english

Файл:

PDF, 1.50 MB

english, 2007

46

The pectic polysaccharide from Bupleurum falcatum L. enhances immune-complexes binding to peritoneal macrophages through Fc receptor expression

Tsukasa Matsumoto, Jong-Chol Cyong, Hiroaki Kiyohara, Hidenori Matsui, Akio Abe, Masumi Hirano, Hirofumi Danbara, Haruki Yamada

Журнал:

International Journal of Immunopharmacology

Рік:

1993

Мова:

english

Файл:

PDF, 703 KB

english, 1993

47

Photophysical characterization of cumarin-doped poly (lactic acid) microparticles and visualization of the biodistribution

Shigeaki Abe, Takayuki Kiba, Kiyotada Hosokawa, Satoru Nitobe, Takashi Hirota, Hirohisa Kobayashi, Tsukasa Akasaka, Motohiro Uo, Yoshinori Kuboki, Shin-Ichiro Sato, Fumio Watari, Iosif D. Rosca

Журнал:

Journal of Electron Spectroscopy and Related Phenomena

Рік:

2010

Мова:

english

Файл:

PDF, 455 KB

english, 2010

48

Development of a novel transparent substrate coated by carbon nanotubes through covalent bonding

Shigeaki Abe, Katsutoshi Nakayam, Daisuke Hayashi, Tsukasa Akasaka, Motohiro Uo, Fumio Watari, Tomoya Takada

Журнал:

Physics Procedia

Рік:

2011

Мова:

english

Файл:

PDF, 270 KB

english, 2011

49

Electrocatalytic CO2 reduction by cobalt octabutoxyphthalocyanine coated on graphite electrode

Toshiyuki Abe, Fumio Taguchi, Tsukasa Yoshida, Sumio Tokita, Günter Schnurpfeil, Dieter Wöhrle, Masao Kaneko

Журнал:

Journal of Molecular Catalysis A: Chemical

Рік:

1996

Мова:

english

Файл:

PDF, 641 KB

english, 1996

50

Influence of NH3/Ar plasma irradiation on physical and photocatalytic properties of TiO2 nanopowder

Hiroya Abe, Tsukasa Kimitani, Makio Naito

Журнал:

Journal of Photochemistry and Photobiology A: Chemistry

Рік:

2006

Мова:

english

Файл:

PDF, 305 KB

english, 2006